An Analysis of Low Frequency Discharge in a CH3SiCl3-Ar-H2 Mixture by Optical Emission Spectroscopy and Actinometry

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Category:: Magazine publication
Type:: Magazine publication
Published in:: PLASMA CHEMISTRY AND PLASMA PROCESSING no. 30, edition 5, pages 641 - 661,
ISSN: 0272-4324
ISSN:: 0272-4324
Publication year:: 2010
DOI:: Digital Object Identifier (open in new tab) 10.1007/s11090-010-9238-3
Verified by:: No verification

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