Search
Description
The DataSet contains the atomic force microscope images of isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 20 to 90 seconds
A Nanosurf Easyscan 2 AFM atomic force microscopy was used to examine the morphology of thin films.
Dataset file
AFM.zip
4.1 MB,
S3 ETag
13339fdd0877ab63ee0598d028f43ee5-1,
downloads: 74
The file hash is calculated from the formula
Example script for calculation:
https://github.com/antespi/s3md5
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tab
CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- Gwyddion
Details
- Year of publication:
- 2021
- Verification date:
- 2021-06-21
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/694j-mt27 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- dataset XRD patterns of V2O5 thin films deposited on isotropic etching silicon substrates (111)
- dataset SEM micrographs of V2O5 thin films deposited on isotropic etching silicon substrates (111)
Cite as
Authors
seen 122 times