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Optically transparent boron-doped nanocrystalline diamond films for spectroelectrochemical measurements on different substrates
Abstract
Fabrication process of optically transparent boron nanocrystalline diamond (BNCD) electrode on silicon and quartz substrate was shown. The B-NCD films were deposited on the substrates using Microwave Plasma Assisted Chemical Vapor Deposition (MWPACVD) at glass substrate temperature of 475 ºC. A homogenous, continuous and polycrystalline surface morphology with high sp3 content in B-NCD films and film thickness depending from substrate in the range of 60-300 nm was obtained. The high refraction index and transparency in visible (VIS) wavelength range was achieved. Moreover, cyclic voltammograms (CV) were recorded to determine reaction reversibility at the B-NCD electrode. CV measurements in aqueous media consisting of 1 mM K3[Fe(CN)6] in 0.5 M Na2SO4 demonstrated relatively fast kinetics expressed by a redox peak splitting below 503 mV for B-NCD/silicon and 110 mv for B-NCD/quartz.
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Authors (5)
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Katarzyna Siuzdak
- IMP PAN Centrum Techniki Laserowej i Plazmowej
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Łukasz Skowroński
- Uniwersytet Techniczno-Przyrodniczy w Bydgoszczy instytut Matematyki i Fizyki
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Keywords
Details
- Category:
- Conference activity
- Type:
- materiały konferencyjne indeksowane w Web of Science
- Title of issue:
- 39th International Microelectronics and Packaging IMAPS strony 1 - 10
- ISSN:
- 1757-8981
- Language:
- Polish
- Publication year:
- 2015
- Bibliographic description:
- Sobaszek M., Siuzdak K., Skowroński Ł., Bogdanowicz R., Pluciński J..: Optically transparent boron-doped nanocrystalline diamond films for spectroelectrochemical measurements on different substrates , W: 39th International Microelectronics and Packaging IMAPS, 2015, IOP PUBLISHING LTD,.
- DOI:
- Digital Object Identifier (open in new tab) 10.1088/1757-899x/104/1/012024
- Verified by:
- Gdańsk University of Technology
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