Abstract
Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C2Hm/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp3 and sp2 C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C2H4/Ar and C2H6/Ar gas mixtures have ID/IG ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C2H4/Ar and C2H6/Ar films, respectively, at a photon energy of 2 eV.
Citations
-
1 0
CrossRef
-
0
Web of Science
-
1 1
Scopus
Authors (7)
Cite as
Full text
- Publication version
- Accepted or Published Version
- DOI:
- Digital Object Identifier (open in new tab) 10.3390/ma9070594
- License
- open in new tab
Keywords
Details
- Category:
- Articles
- Type:
- artykuł w czasopiśmie wyróżnionym w JCR
- Published in:
-
Materials
no. 9,
edition 7,
pages 1 - 12,
ISSN: 1996-1944 - Language:
- English
- Publication year:
- 2016
- Bibliographic description:
- Chandrashekaraiah T., Bogdanowicz R., Rühl E., Danilov V., Meichsner J., Thierbach S., Hippler R.: Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge// Materials. -Vol. 9, iss. 7 (2016), s.1-12
- DOI:
- Digital Object Identifier (open in new tab) 10.3390/ma9070594
- Verified by:
- Gdańsk University of Technology
seen 373 times
Recommended for you
Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures
- T. Chandrashekaraiah,
- R. Bogdanowicz,
- V. Danilov
- + 3 authors
Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering
- V. Stranak,
- M. Quaas,
- R. Bogdanowicz
- + 4 authors
Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering.
- V. Stranak,
- Z. Hubicka,
- M. Cada
- + 4 authors