Wyszukiwarka
Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering.
Abstrakt
Iron oxide films were deposited using high power impulse magnetron sputtering (HiPIMS) of an iron cathode in an argon/oxygen gas mixture at different gas pressures (0.5~Pa, 1.5~Pa, and 5.0~Pa). The HiPIMS system was operated at a repetition frequency $f = 100$~Hz with a duty cycle of 1~\%. A main goal is a comparison of film growth during conventional and electron cyclotron wave resonance-assisted HiPIMS. The deposition plasma was investigated by means of optical emission spectroscopy and energy-resolved mass spectrometry. Active oxygen species were detected and their kinetic energy was found to depend on the gas pressure. Deposited films were characterized by means of spectroscopic ellipsometry and grazing incidence x-ray diffraction. Optical properties and crystallinity of as-deposited films were found to depend on the deposition conditions. Deposition of hematite iron oxide films with the HiPIMS-ECWR discharge is attributed to the enhanced production of reactive oxygen species.
Cytowania
-
1 2
CrossRef
-
0
Web of Science
-
1 2
Scopus
Autorzy (7)
-
Vitezslav Stranak
-
Zdenek Hubicka
-
Martin Cada
-
Harm Wulff
-
Christine Helm
-
Rainer Hippler
Cytuj jako
Pełna treść
- Wersja publikacji
- Accepted albo Published Version
- DOI:
- Cyfrowy identyfikator dokumentu elektronicznego (otwiera się w nowej karcie) 10.1088/1361-6463/aaa9e6
- Licencja
-
otwiera się w nowej karcie
Słowa kluczowe
Informacje szczegółowe
- Kategoria:
- Publikacja w czasopiśmie
- Typ:
- artykuł w czasopiśmie wyróżnionym w JCR
- Opublikowano w:
-
JOURNAL OF PHYSICS D-APPLIED PHYSICS
nr 51,
strony 1 - 12,
ISSN: 0022-3727 - Język:
- angielski
- Rok wydania:
- 2018
- Opis bibliograficzny:
- Stranak V., Hubicka Z., Cada M., Bogdanowicz R., Wulff H., Helm C., Hippler R.: Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering.// JOURNAL OF PHYSICS D-APPLIED PHYSICS. -Vol. 51, nr. 9 (2018), s.1-12
- DOI:
- Cyfrowy identyfikator dokumentu elektronicznego (otwiera się w nowej karcie) 10.1088/1361-6463/aaa9e6
- Weryfikacja:
- Politechnika Gdańska
wyświetlono 136 razy
Publikacje, które mogą cię zainteresować
Tailoring properties of indium tin oxide thin films for their work in both electrochemical and optical label-free sensing systems
- P. Sezemsky,
- D. Burnat,
- J. Kratochvil
- + 11 autorów
Effect of nitrogen doping on TiOxNy thin film formation at reactive high-power pulsed magnetron sputtering
- V. Stranak,
- M. Quaas,
- R. Bogdanowicz
- + 4 autorów
Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges
- V. Stranak,
- R. Bogdanowicz,
- P. Sezemsky
- + 6 autorów
Physical properties of homogeneous TiO2 films prepared by high power impulse magnetron sputtering as a function of crystallographic phase and nanostructure
- V. STRAňáK,
- M. Čada,
- M. Quaas
- + 7 autorów