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Thermal Instability of Gold Thin Films

Abstrakt

The disintegration of a continuous metallic thin film leads to the formation of isolated islands, which can be used for the preparation of plasmonic structures. The transformation mechanism is driven by a thermally accelerated diffusion that leads to the minimalization of surface free energy in the system. In this paper, we report the results of our study on the disintegration of gold thin film and the formation of nanoislands on silicon substrates, both pure and with native silicon dioxide film. To study the processes leading to the formation of gold nanostructures and to investigate the effect of the oxide layer on silicon diffusion, metallic film with a thickness of 3 nm was deposited by molecular beam epitaxy (MBE) technique on both pure and oxidized silicon substrates. Transformation of the thin film was observed by low-energy electron microscopy (LEEM) and a scanning electron microscope (SEM), while the nanostructures formed were observed by atomic force microscope (AFM) method. Structural investigations were performed by low-energy electron diffraction (LEED) and X-ray photoelectron spectroscopy (XPS) methods. Our experiments confirmed a strong correlation between the formation of nanoislands and the presence of native oxide on silicon substrates.

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Informacje szczegółowe

Kategoria:
Publikacja w czasopiśmie
Typ:
artykuły w czasopismach
Opublikowano w:
Coatings nr 13,
ISSN: 2079-6412
Język:
angielski
Rok wydania:
2023
Opis bibliograficzny:
Łapiński M., Dróżdż P., Gołębiowski M., Okoczuk P., Karczewski J., Sobanska M., Pietruczik A., Zytkiewicz Z. R., Zdyb R., Sadowski W., Kościelska B.: Thermal Instability of Gold Thin Films// Coatings -,iss. 8 (2023), s.1306-
DOI:
Cyfrowy identyfikator dokumentu elektronicznego (otwiera się w nowej karcie) 10.3390/coatings13081306
Źródła finansowania:
  • Działalność statutowa/subwencja
Weryfikacja:
Politechnika Gdańska

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