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Description
Gold nanostructures were prepared on silicon - Si(111) as a substrate. as a result of dewetting process. Thin golds films were deposited using a table-top dc magnetron sputtering coater under pure Ar plasma conditions . The Au target had 99.99% purity, the rate of Au layer deposition was about 0.4 nm·s−1 and the incident power was 32 W. The thickness of the films was measured in situ by a quartz crystal microbalance. To analyze the surface morphology of the samples, a FEI Quanta FEG 250 scanning electron microscope (SEM) operated at 10 kV was used. Samples with 1.2, 1.5 and 3.4 nm of initial Au layer anealed at 650 deg for 5, 10 and 15 minutes were measured.
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650.zip
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- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-26
- Creation date:
- 2021
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/dg3a-fg46 open in new tab
- Verified by:
- Gdańsk University of Technology
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