Description
Silver thin films with a thickness of 1nm, 3nm, 5nm, 7nm and 9nm were deposited by a table-top magnetron sputtering unit in a pure argon plasma from a high-purity silver target. Silicon wafers was used as a substrates. As-deposired films were annealed in Ar atmosphere at 550 Celsius degree for 15 minutes.As a result of annealing, Ag nanostructures formed on silicon. Morphology of obtained nanostructures was measured by SEM technique (FEI Quanta microscope).
Dataset file
Ag_SEM.zip
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File details
- License:
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open in new tabCC BYAttribution
- Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-05
- Creation date:
- 2018
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/jnrk-sy18 open in new tab
- Verified by:
- Gdańsk University of Technology
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