Abstract

Purpose: The major aim of this paper was describing technical conditions of polymer thin film deposition byspin-coating techniques.Design/methodology/approach: Thin films of about nanometres thickness were prepared by spin-coatingand their properties were studied. As a material for preparing polymer thin films oxad-Si was used. The thinfilms were deposited with various spinning velocity from solution of different concentration. Thin films weredeposited on BK7 glass and quartz substrates.Findings: The obtained results describe influence of the solution concentration and spinning velocity onmorphology and optical properties of spin-coated oxad-Si thin films.Research limitations/implications: The obtained results confirm the oxad-Si availability for optoelectronicapplication to be stipulated.Practical implications: The morphology and optical properties of Oxad-Si polymer thin films were described. Thispaper include also description of the influence of deposition conditions on properties of polymer thin films.Originality/value: The value of this paper is defining the optimal parameters of spin-coating technology forpreparing oxad-Si thin film with the best properties for optoelectronics appliances. This paper describes newexperimental polymeric material for spin coating technology. Results of these researches enable to develop thespin-coating technology
(PDF) Studying of spin-coated oxad-Si properties. Available from: https://www.researchgate.net/publication/44444888_Studying_of_spin-coated_oxad-Si_properties [accessed Oct 29 2024].

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