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Description
Thin films were prepared by radio frequency reactive magnetron sputtering technique. Metallic Te target was sputtered for about 45 min in argon-oxygen atmosphere what resulted in 300 nm film thickness deposition. The pressure in the chamber was below 0.2 Pa and substrate was heated at 200 °C. The distance between sputtered target and the Corning 1737 glass substrate was about 10 cm. Chemical composition of prepared samples was analyzed by X-ray photoemission spectroscopy method (XPS). The XPS measurement was performed at room temperature under ultra-high vacuum conditions, at pressures below 1.1 × 10−6 Pa by Omicron NanoScience equipment. Data analysis was performed with the CASA XPS software package using a Shirley background subtraction and least-square GaussianLorentzian – GL(30) curve fitting algorithm. The spectra obtained were calibrated to give a binding energy of 285.00 eV for C 1s. In this data set results of XPS investigations of thin films deposired under variuos Ar-O ratio are presented.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-12
- Creation date:
- 2019
- Dataset language:
- English
- Fields of science:
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- information and communication technology (Engineering and Technology)
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/jsg3-yy74 open in new tab
- Verified by:
- Gdańsk University of Technology
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