Depth profile of the chemical composition of the Au-Ag multilayers - Open Research Data - Bridge of Knowledge

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Depth profile of the chemical composition of the Au-Ag multilayers

Description

Silver and gold multilayers were deposited on a silicon substrate by magnetron sputtering method. Both type, Au and Ag thin films had 2 nm of thickness. Totally structure had thickness of 6 nm (Au-Ag-Au). That prepared multilayers were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching surface of sample. Each cycle of etching takes 60 sec. It was repeated 6 times. As a result of etching, and simultaneous XPS measurements a profile of concentration. For measurements XPS UHV system, Omicron Nanotechnology, equpied with Ar ion gun was used.

Dataset file

wielowarstwa au ag xps.opj
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File details

License:
Creative Commons: by 4.0 open in new tab
CC BY
Attribution
Raw data:
Data contained in dataset was not processed.
Software:
origin

Details

Year of publication:
2021
Verification date:
2021-07-14
Creation date:
2019
Dataset language:
English
Fields of science:
  • materials engineering (Engineering and Technology)
DOI:
DOI ID 10.34808/3jz5-mq25 open in new tab
Verified by:
Gdańsk University of Technology

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