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Description
Silver nanostructures were prepared on Si substrate. Thin Ag films (2 and 6 nm thickness) were deposited using a tabletop dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma. The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1 , and the incident power was in the range of 30–40 W. The layer thickness was measured in situ using a quartz crystal microbalance. To form nanostructures, the as-prepared films were put into a hot furnace and annealed in argon atmosphere at different temperatures for different periods of time. Oxidaton of silver nanostructures was measured by XPS method. Additionally a bulk silver was measured. In this dataset XPS O1s specra are presented.
Dataset file
O.opj
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File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-26
- Creation date:
- 2020
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/2f1w-gj73 open in new tab
- Verified by:
- Gdańsk University of Technology
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