Search
Description
Silver nanostructures were prepared on Si substrate. Thin Ag films (2 and 6 nm thickness) were deposited using a tabletop dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma. The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1 , and the incident power was in the range of 30–40 W. The layer thickness was measured in situ using a quartz crystal microbalance. To form nanostructures, the as-prepared films were put into a hot furnace and annealed in argon atmosphere at different temperatures for different periods of time. Oxidaton of silver nanostructures was measured by XPS method. Additionally a bulk silver was measured. In this dataset XPS O1s specra are presented.
Dataset file
O.opj
289.7 kB,
S3 ETag
1b5fa1d39dfb35a21cc42ab04f720c8a-1,
downloads: 17
The file hash is calculated from the formula
Example script for calculation:
https://github.com/antespi/s3md5
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tab
CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-26
- Creation date:
- 2020
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/2f1w-gj73 open in new tab
- Verified by:
- Gdańsk University of Technology
Keywords
Cite as
Authors
seen 64 times