Description
Metallic nanostructures (gold and silver) were manufactured as a thermal annealing of gold or silver thin film. Gold films with thickness of 2.8 nm were deposited on a silicon substrates using a table-top dc magnetron sputtering coater (EM SCD 500, Leica), equipped with quartz microbalance for in-situ thickness measurements. Films were deposited from high purity (99.99%) gold or silver targets in pure Argon plasma. Thermal treatment of metallic thin film resulted in forming spherical isolated islands. XRD investigations (X'Pert diffractometer, using CuKα radiation in a range of 10°–70° of 2θ) showed an epitaxial growth of the structures. The crystallographic structure of metallic nanostructures repeat structure of silicon substrate.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count}
where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tabCC BYAttribution
- Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-06-24
- Creation date:
- 2017
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/ctbw-ab05 open in new tab
- Verified by:
- Gdańsk University of Technology
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