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High resolution X-ray diffractometry and reflectometry of semiconductor nano- and micro- structures based on X-ray refractive optics

Abstract

In this thesis proposed, discussed and studied novel synchrotron X-ray diffractometry and reflectometry methods based on a refractive optics. The experimental results obtained from the ID06 beamline at ESRF, Grenoble, France are presented and analyzed in this work to demonstrate a high angular and space resolution in addition to the opportunity to manage in situ and on operando experiments with the help of proposed X-ray optical techniques. As a novel high resolution X-ray diffraction (HRXRD) method is proposed Fourier transform by beryllium compound refractive lenses. The Si-Ge nano-heteroepitaxial structure representing a 100 nm Ge nanocrystals on free-standing 90 nm wide and 150 nm height Si pillars with a periodicity of 360 nm was studied by this new approach. Has been demonstrated the ability to resolve micro-radian diffraction with highest resolution as possible for today. Besides the proposed and tested the concept of using compound refractive lenses(CRL) for creating reflecto-interferogramm which gives opportunity in a thin films and membranes express analyses. By new approach have been resolved thickness oscillation from Si3N4 membranes with thickness 200, 500 and 1000 nm. Also was studied degradation process of 100 nm PMMA film under X-ray exposure.

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Category:
Thesis, nostrification
Type:
praca doktorska pracowników zatrudnionych w PG oraz studentów studium doktoranckiego
Language:
English
Publication year:
2017
Verified by:
Gdańsk University of Technology

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