Search results for: SUBSTRATE INTEGRATED SQUARE CAVITY, FREQUENCY RECONFIGURABLE, SELF-QUADRUPLEXING ANTENNA, MICROFLUIDIC

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Chemical composition of tellurium oxides thin films deposited by magnetron sputtering method
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- M. Łapiński
Thin films were prepared by radio frequency reactive magnetron sputtering technique. Metallic Te target was sputtered for about 45 min in argon-oxygen atmosphere what resulted in 300 nm film thickness deposition. The pressure in the chamber was below 0.2 Pa and substrate was heated at 200 °C. The distance between sputtered target and the Corning 1737...

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Search results for: SUBSTRATE INTEGRATED SQUARE CAVITY, FREQUENCY RECONFIGURABLE, SELF-QUADRUPLEXING ANTENNA, MICROFLUIDIC

Chemical composition of tellurium oxides thin films deposited by magnetron sputtering method