Search results for: PLASMA CVD

• Prediction of the properties of PVD/CVD coatings with the use of FEM analysis

  Publication

  • A. Śliwa
  • J. Mikuła
  • K. Gołombek
  • T. Tański
  • W. Kwaśny
  • M. Bonek
  • Z. Brytan

  - Applied Surface Science - Year 2016

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• Robert Bogdanowicz dr hab. inż.

  People

  Department of Metrology and Optoelectronics

  Robert Bogdanowicz received his Ph.D. degree with honours in Electronics from the Gdansk University of Technology. He worked as a post-doc researcher in Ernst-Moritz-Arndt-Universität Greifswald Institut für Physik. He has initiated optical emission imaging of muti-magnetron pulsed plasma and contributed to the development of antibacterial implant coatings deposited by high-power impulse magnetron sputtering. He moved back to...

• PLASMA CHEMISTRY AND PLASMA PROCESSING

  Journals

  ISSN: 0272-4324 , eISSN: 1572-8986

• PLANTA MEDICA

  Journals

  ISSN: 0032-0943 , eISSN: 1439-0221

• The Problems of Application of PVD/CVD Thin Hard Coatings for Heavy-Loaded Machine Components

  Publication

  • M. Szczerek
  • R. Michalczewski
  • W. Piekoszewski

  - Year 2007

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• Plasma Medicine

  Journals

  ISSN: 1947-5764 , eISSN: 1947-5772

• CONTRIBUTIONS TO PLASMA PHYSICS

  Journals

  ISSN: 0863-1042 , eISSN: 1521-3986

• RAMAN DIAGNOSTICS OF CVD DIAMOND GROWTH

  Publication

  • M. Gnyba

  - Year 2012

  Development of Raman spectroscopic system for diagnostics of growth of diamond and BDD (Boron- Doped-Diamond) thin films during μPA CVD (Microwave Plasma Assisted Chemical Vapour Deposition) process is described. Raman studies of such films were carried out as in-situ monitoring of film deposition as ex-situ measurements conducted for a sample outside the reaction vessel after manufacturing process. Modular system for the in-situ...

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• Diagnostyka procesu CVD metodą optycznej spektroskopii emisyjnej. Diagnostics of CVD process by means of optical emission spectroscopy.

  Publication

  • P. Wroczyński
  • M. Gnyba
  • R. Bogdanowicz

  - Year 2004

  Zastosowano optyczną spektroskopię emisyjną do badania w trybie in-situ dysocjacji cząsteczek oraz wzbudzenia i jonizacji atomów wodoru podczas procesu syntezy cienkich warstw diamentowych metodą chemicznego osadzania z par gazowych wspomaganego plazmą mikrofalową (mPACVD). Zbudowano tor światłowodowy, umożliwiający sprzężenie komory CVD z systemem spektroskopowym i wykonywanie pomiarów bezinwazyjnych. Wykonano pomiary spektralne...

• NURT SVD

  Journals

  ISSN: 1233-9717