Description
Silver and gold multilayers were deposited on a silicon substrate by magnetron sputtering method. Both type, Au and Ag thin films had 2 nm of thickness. Totally structure had thickness of 6 nm (Au-Ag-Au). That prepared multilayers were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching surface of sample. Each cycle of etching takes 60 sec. It was repeated 6 times. As a result of etching, and simultaneous XPS measurements a profile of concentration. For measurements XPS UHV system, Omicron Nanotechnology, equpied with Ar ion gun was used.
Dataset file
wielowarstwa au ag xps.opj
204.2 kB,
S3 ETag
8e9eb4a7ed856c6334660024b5c1d01e-1,
downloads: 38
The file hash is calculated from the formula
Example script for calculation:
https://github.com/antespi/s3md5
hexmd5(md5(part1)+md5(part2)+...)-{parts_count}
where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tabCC BYAttribution
- Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-14
- Creation date:
- 2019
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/3jz5-mq25 open in new tab
- Verified by:
- Gdańsk University of Technology
Keywords
Cite as
Authors
seen 81 times