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Description
Silver and gold bimetallic layers were deposited on a silicon substrate by magnetron sputtering method. Both, Au and Ag layers had 3 nm of thickness. That prepared nanostructures were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching surface of sample. Each cycle of etching takes 30 sec. It was repeated 7 times. As a result of etching, and simultaneous XPS measurements a profile of concentration. For measurements XPS UHV system, Omicron Nanotechnology, equpied with Ar ion gun was used.
Dataset file
dwuwarstwa au ag xps.opj
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File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-14
- Creation date:
- 2019
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/fxwa-ce13 open in new tab
- Verified by:
- Gdańsk University of Technology
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