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Description
Manganium-Cobaltium thin films were electrochemically deposited on a Ni foams subsrates in a one-step process at −1.1 V vs. Ag/AgCl in an aqueous solution of differently concentrated Mn(NO3)2·4H2O and Co(NO3)2·6H2O with the deposition time limited by charges of 60, 120, and 200 mC at 25 °C. The concentration ratios of Mn(NO3)2·4H2O to Co(NO3)2·6H2O were 2 mM to 4 mM, 2 mM to 6 mM, 2 mM to 8 mM, 4 mM to 2 mM, and 0 mM to 4 mM. The chemical characterisation of the substrate was performed by XPS method. High resolution spectra of the Ni2p region were measured. X-ray photoemission spectroscopy measurements were carried out with Omicron NanoTechnology ultra-high vacuum equipment. The hemispherical spectrophotometer was equipped with a 128-channel collector. The XPS measurements were performed at room temperature at a pressure below 1.1 × 10−8 mBar. The photoelectrons were excited by an Mg-Kα X-Ray source. The X-ray anode was operated at 15 keV and 300 W.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-07-20
- Creation date:
- 2019
- Dataset language:
- English
- Fields of science:
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- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/c649-my11 open in new tab
- Verified by:
- Gdańsk University of Technology
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