The scanning electron microscopy (SEM) studies of low voltage copper cables

Description

The dataset contains the scanning electron microscopy (SEM) images of the low voltage copper cables, which were studied in the article discussing the regulatory requirements for checking the electrical resistance of such cables. The cables were cut and studies in cross-section. The full results were published in:

Olesz, M., & Ryl, J. (2013). BADANIE REZYSTANCJI ELEKTRYCZNEJ ŻYŁ WYBRANYCH PRZEWODÓW. Zeszyty Naukowe Wydziału Elektrotechniki I Automatyki Politechniki Gdańskiej, 35, 35-38.

The VP-SEM Hitachi S-3400N microscope was utilized, studying the cross-section topography using secondary electron mode, at 20 kV accelerating voltage. Magnifications used: 50 - 10000x.

Dataset file

resistance-sem.zip

31.2 MB, S3 ETag 1b100258589d997b1ded1763d6afcc9d-1, downloads: 72

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CC BY

Attribution
Raw data:: Data contained in dataset was not processed.

Details

Year of publication:

2013

Verification date:

2021-04-27

Dataset language:

English

Fields of science:

materials engineering (Engineering and Technology)
Automation, electronic and electrical engineering (Engineering and Technology)

DOI:

10.34808/j6v6-dg64

Verified by:

Gdańsk University of Technology

Keywords

References

publication BADANIE REZYSTANCJI ELEKTRYCZNEJ ŻYŁ WYBRANYCH PRZEWODÓW

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