XRD analysis of the tellurium dioxide thin films - Open Research Data - Bridge of Knowledge

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XRD analysis of the tellurium dioxide thin films

Description

Tellurium dioxide thin films were deposited by magnetron sputtering method. The XRD analysis of the films annealed at 200, 500, 650 and 700 celsius degree showed appearing of crystalline phase in a higher temeratures.

Dataset file

Te.zip
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License:
Creative Commons: by 4.0 open in new tab
CC BY
Attribution
Raw data:
Data contained in dataset was not processed.
Software:
origin

Details

Year of publication:
2021
Verification date:
2021-06-24
Creation date:
2019
Dataset language:
English
Fields of science:
  • materials engineering (Engineering and Technology)
DOI:
DOI ID 10.34808/nhbk-7448 open in new tab
Verified by:
Gdańsk University of Technology

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