An Analysis of Low Frequency Discharge in a CH3SiCl3-Ar-H2 Mixture by Optical Emission Spectroscopy and Actinometry
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- Category:
- Magazine publication
- Type:
- Magazine publication
- Published in:
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PLASMA CHEMISTRY AND PLASMA PROCESSING
no. 30,
edition 5,
pages 641 - 661,
ISSN: 0272-4324 - ISSN:
- 0272-4324
- Publication year:
- 2010
- DOI:
- Digital Object Identifier (open in new tab) 10.1007/s11090-010-9238-3
- Verified by:
- No verification
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