Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges - Publication - Bridge of Knowledge

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Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

Abstract

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Authors (8)

  • Photo of  V. Stranak

    V. Stranak

  • Photo of  H. Wulff

    H. Wulff

  • Photo of  R. Bogdanowicz

    R. Bogdanowicz

  • Photo of  S. Drache

    S. Drache

  • Photo of  Z. Hubicka

    Z. Hubicka

  • Photo of  M. Cada

    M. Cada

  • Photo of  M. Tichy

    M. Tichy

  • Photo of  R. Hippler

    R. Hippler

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Details

Category:
Magazine publication
Type:
Magazine publication
Published in:
EUROPEAN PHYSICAL JOURNAL D no. 64, edition 2-3, pages 427 - 435,
ISSN: 1434-6060
ISSN:
1434-6060
Publication year:
2011
DOI:
Digital Object Identifier (open in new tab) 10.1140/epjd/e2011-20393-7
Verified by:
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