Abstract

Purpose: The aim of this paper is to show influence of technological parameters (temperature and gas streamintensity) of low-temperature chemical vapour deposition (LCVD) on optical properties and morphology ofpolyazomethine thin films.Design/methodology/approach: Thin layers of poly (1,4-phenylene-methylenenitrilo-1,4-phenylenenitrilo-methylene) (PPI) were prepared by low temperature LCVD method with use of argon as a transport agent. TheUV-Vis spectroscopy and AFM microscopy measurements on PPI thin films were performed.Findings: The LCVD parameters, like temperature and argon stream intensity, influence growth rate,morphology and optical properties of polyazomethine thin films. Optimalization of technical parameters allowsfor thin films with desired properties to be prepared.Research limitations/implications: Optimalization of technical LCVD parameters leads to preparing PPI thinfilms having desired morphology and optical properties suitable for optoelectronic applications.Practical implications: PPI polyazomethine is good material for potential applications as the active layer inoptoelectronic or photonic structure (diods or photovoltaic cells).Originality/value: LCVD with use of argon is relatively new method for preparing of thin polymer films.Recognizing of optimal technical parameters will make possible getting of thin films with required properties.
(PDF) Influence of LCVD technological parameters on properties of polyazomethine thin films. Available from: https://www.researchgate.net/publication/44385652_Influence_of_LCVD_technological_parameters_on_properties_of_polyazomethine_thin_films [accessed Oct 29 2024].

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