Moisture damage mechanism and material selection of HMA with amine antistripping agent - Publication - Bridge of Knowledge

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Moisture damage mechanism and material selection of HMA with amine antistripping agent

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Authors (6)

  • Photo of  Rui Xiao

    Rui Xiao

  • Photo of  Yongjie Ding

    Yongjie Ding

  • Photo of dr inż. Pawel Polaczyk

    Pawel Polaczyk dr inż.

  • Photo of  Yuetan Ma

    Yuetan Ma

  • Photo of  Xi Jiang

    Xi Jiang

  • Photo of  Baoshan Huang

    Baoshan Huang

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Details

Category:
Magazine publication
Type:
Magazine publication
Published in:
Materials & Design no. 220,
ISSN: 0264-1275
ISSN:
02641275
Publication year:
2022
DOI:
Digital Object Identifier (open in new tab) 10.1016/j.matdes.2022.110797
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