Spectroscopic study of the decomposition process of tetramethylsilane in the N2–H2 and N2–Ar low pressure plasma - Publication - Bridge of Knowledge

Spectroscopic study of the decomposition process of tetramethylsilane in the N2–H2 and N2–Ar low pressure plasma

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Authors (3)

P. Jamroz
W. Zyrnicki
Piotr Jamroz

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Category:: Magazine publication
Type:: Magazine publication
Published in:: DIAMOND AND RELATED MATERIALS no. 14, edition 9, pages 1498 - 1507,
ISSN: 0925-9635
ISSN:: 0925-9635
Publication year:: 2005
DOI:: Digital Object Identifier (open in new tab) 10.1016/j.diamond.2005.03.008
Verified by:: No verification

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