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Abstract
The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties are attributed to change of crystalline structure measured by XRD methods.
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Authors (9)
-
Vitezslav Stranak
- University of South Bohemia
-
Petr Sezemsky
- University of South Bohemia
-
Harm Wulff
- University of Greifswald
-
Angela Kruth
- Leibniz Institute for Plasma Science and Technology
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Mateusz Smietana
- Warsaw University of Technology
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Jiri Kratochvil
- University of South Bohemia
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Martin Cada
- Institute of Physics, Academy of Science of the Czech Republic
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Zdenek Hubicka
- Institute of Physics, Academy of Science of the Czech Republic
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Details
- Category:
- Articles
- Type:
- artykuł w czasopiśmie wyróżnionym w JCR
- Published in:
-
SURFACE & COATINGS TECHNOLOGY
no. 335,
pages 126 - 133,
ISSN: 0257-8972 - Language:
- English
- Publication year:
- 2018
- Bibliographic description:
- Stranak V., Bogdanowicz R., Sezemsky P., Wulff H., Kruth A., Smietana M., Kratochvil J., Cada M., Hubicka Z.: Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges// SURFACE & COATINGS TECHNOLOGY. -Vol. 335, (2018), s.126-133
- DOI:
- Digital Object Identifier (open in new tab) 10.1016/j.surfcoat.2017.12.030
- Verified by:
- Gdańsk University of Technology
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