Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges - Publikacja - MOST Wiedzy

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Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges

Abstrakt

The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties are attributed to change of crystalline structure measured by XRD methods.

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Vitezslav Stranak, Robert Bogdanowicz, Petr Sezemsky, Harm Wulff, Angela Kruth, Mateusz Smietana, Jiri Kratochvil, Martin Cada, Zdenek Hubicka. (2018). Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges, 335, 126-133. https://doi.org/10.1016/j.surfcoat.2017.12.030

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Informacje szczegółowe

Kategoria:
Publikacja w czasopiśmie
Typ:
artykuł w czasopiśmie wyróżnionym w JCR
Opublikowano w:
SURFACE & COATINGS TECHNOLOGY nr 335, strony 126 - 133,
ISSN: 0257-8972
Język:
angielski
Rok wydania:
2018
Opis bibliograficzny:
Stranak V., Bogdanowicz R., Sezemsky P., Wulff H., Kruth A., Smietana M., Kratochvil J., Cada M., Hubicka Z.: Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges// SURFACE & COATINGS TECHNOLOGY. -Vol. 335, (2018), s.126-133

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