Search results for: DIELECTRIC SUBSTRATE - Bridge of Knowledge

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  • TEM and EDX study of the Al2O3 ultra thin films

    Open Research Data
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    The ultra-thin layers of Al2O3 were deposited on a silicon substrates. The method of atomic layer deposition (Beneq TFS 200 ALD system) was chosen as the proper method of dielectric layer deposition. This method provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water....

  • Nanostructures fabrication with use of electrical AFM litography

    Open Research Data

    In the last 10 years, one of the nanotechnological trends has been observed, consisting in the development of new variants of computer memory systems with high capacity and speed of access, using quantum dots. One of the techniques for creating nanodots and other nanostructures is based on the use of an atomic force microscope acting as a lithographic...