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Description
Silver nanostructures were prepared on borosilicate glass (Corning 1737F) substrates. Thin Ag films (1–9 nm thickness) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products 99.999%). The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1, and the incident power was in the range of 30–40 W. The layer thickness was measured in situ using a quartz crystal microbalance. To form nanostructures, the as-prepared films were put into a hot furnace and annealed in argon atmosphere at different temperatures for different periods of time. Plasmon resonance was observed in a UV-VIS (Thermo Fisher Scientific Evolution 220 spectrophotometer in transmission mode, in a range of 200–1100 nm) spectroscopy results, as a absorption peak on transmission spectra.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tab
CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
- Software:
- origin
Details
- Year of publication:
- 2021
- Verification date:
- 2021-06-25
- Creation date:
- 2018
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/6qt2-hq69 open in new tab
- Verified by:
- Gdańsk University of Technology
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