XRD and electrochemical results for MoO3 films deposited using pulsed laser deposition system - Open Research Data - Bridge of Knowledge

Your account

login

Search

XRD and electrochemical results for MoO3 films deposited using pulsed laser deposition system

Description

The attached data contains XRD and electrochemical results for MoO3 films deposited on fluorine-doped tin oxide glasses. Films were deposited using a pulsed laser deposition system at different conditions. Part of the samples was deposited at room temperature and then annealed at 575°C for given times (samples labeled PLD_RT_575C_xmin, where x stands for annealing time). Other samples were deposited at 450°C (PLD_450C) in different gas atmospheres. Electrochemical measurements were performed in 1 M AlCl3 aqueous solution with a 2.5 mV/s scan rate.

Dataset file

PLD_MoO3.zip
181.4 kB, S3 ETag 124ff85308490a6febddec8eb0b421ff-1, downloads: 51
The file hash is calculated from the formula
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.

Example script for calculation:
https://github.com/antespi/s3md5
download file PLD_MoO3.zip

File details

License:
Creative Commons: 0 1.0 open in new tab
CC 0
Public Domain Dedication

Details

Year of publication:
2023
Verification date:
2023-07-03
Creation date:
2023
Dataset language:
English
Fields of science:
  • chemical sciences (Natural sciences)
DOI:
DOI ID 10.34808/8dvd-d053 open in new tab
Verified by:
Gdańsk University of Technology

Keywords

Cite as

Authors

seen 148 times