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Description
The DataSet contains the XRD patterns of V2O5 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under an oxidizing atmosphere in the temperature range of 300-600C. The results show that the structure of the films dependent on the annealing temperature.
X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.
These results are part of a project defined in the Journal of Nanomaterials. In this paper, the information about samples and synthesis details are reported.
Dataset file
XRD Si.zip
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File details
- License:
-
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CC BYAttribution - Software:
- HighScore Plus
Details
- Year of publication:
- 2015
- Verification date:
- 2021-05-24
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/e4hw-ed56 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
- publication Struktury nanokrystaliczne w układzie V O: wytwarzanie i właściwości
- dataset SEM micrographs of morphology evolution of V2O5 thin films on silicon substrate
- dataset Chemical composition of V2O5 nanorods
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