Description
The DataSet contains the XRD patterns of VO2 and V6O13 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under a reducing atmosphere (94% Ar, 6% H2) at 500, 600 and 700C for 10h.
X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.
The information about the preparation of as-prepared thin film is described in the Journal of Nanomaterials.
Dataset file
XRD.zip
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File details
- License:
-
open in new tabCC BYAttribution
- Raw data:
- Data contained in dataset was not processed.
- Software:
- HighScore Plus
Details
- Year of publication:
- 2015
- Verification date:
- 2021-05-25
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/yt18-7224 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
- publication Struktury nanokrystaliczne w układzie V O: wytwarzanie i właściwości
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