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Zespół Metrologii i Optoelektroniki
Research Potential* komputerowo wspomagana metrologia i diagnostyka * projektowanie systemów * mikrosystemów i makrosystemów elektronicznych * testowanie i diagnostyka elektroniczna * pomiary właściwości szumowych i zakłóceń * spektroskopia impedancyjna * telemetria i telediagnostyka internetowa * katedra redaguje Metrology and Measurement Systems * kwartalnik PAN znajdujący się na liście JCR
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Laboratorium Syntezy Innowacyjnych Materiałów i Elementów
Business OfferZespół specjalistycznych urządzeń pozwala dokonywać syntezy diamentu mikro- i nanokrystalicznego oraz diamentu domieszkowanego borem i azotem do zastosowań w optoelektronice oraz nanosensoryce. Domieszkowany borem nanodiament (BDD) jest obecnie najwydajniejszym materiałem półprzewodnikowym do zastosowania w wytwarzaniu biosensorów elektrochemicznych. Laboratorium może otrzymywać ciągłe cienkie polikrystaliczne, domieszkowane elektrody...
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Search results for: elipsometria spektroskopowa
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Robert Bogdanowicz dr hab. inż.
PeopleRobert Bogdanowicz received his Ph.D. degree with honours in Electronics from the Gdansk University of Technology. He worked as a post-doc researcher in Ernst-Moritz-Arndt-Universität Greifswald Institut für Physik. He has initiated optical emission imaging of muti-magnetron pulsed plasma and contributed to the development of antibacterial implant coatings deposited by high-power impulse magnetron sputtering. He moved back to...
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Reactive deposition of TiNx layers in a DC-magnetron discharge
PublicationTiNx layers have been deposited in 'balanced mode' and 'unbalanced mode' of a reactive DC-magnetron plasma (carrier gas argon, reactive gas nitrogen) under different conditions. Discharge power and reactive gas flow have been varied. The layers have been examined by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR), and spectroscopic ellipsometry (SE). The results of the layer analyses were combined with plasma investigations...
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Optical and chemical characterization of thin TiNx films deposited by DC-magnetron sputtering
PublicationThin titanium nitride (tinx) films were deposited on silicon substrates by means of a reactive dc-magnetron plasma. Layers were synthesized under various conditions of discharge power and nitrogen flows in two operation modes of the magnetron (the so-called "balanced" and "unbalanced" modes). The optical constants of the tinx films were investigated by spectroscopic ellipsometry (se). X-ray photoelectron spectroscopy (xps) was...
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Ellipsometric study of carbon nitride films deposited by DC-magnetron sputtering
PublicationWe report the optical properties of a carbon nitride (CNx) film as a function of nitrogen concentration (N/C) of the deposited film. As nitrogen concentration is increased (N/C ratio) in a CNx film, the refractive index and band gap also increase. The real and imaginary parts, n and k (refractive index and extinction coefficient) of the complex refraction index of carbon nitride films were determined by spectroscopic ellipsometry...
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Role of nitrogen in optical and electrical band gaps of hydrogenated/hydrogen free carbon nitride film
PublicationWe report the optical and electrical band gap energy of amorphous hydrogenated carbon nitride (a-HCNx) and carbon nitride (a-CNx) as a function of nitrogen concentration (N/C). The optical band gap of a-HCNx and a-CNx films has been determined by means of Ellipsometry and UV-VIS. Both optical and electrical band gaps increase with elevated nitrogen concentration. Experimentally obtained electrical band gap is compared with the...