Abstract
A novel microwave pulsed-plasma based method for the modification of the hydrogen-terminated polycrystalline boron-doped diamond (BDD) with a thin film of polymerized allylamine (PPAAm) is reported. A modified BDD surface is resistant to hydrolysis and delamination and is characterized by a high density of positively charged amino groups. Pulsed microwave plasma was applied to improve the degree of cross-linking and bonding of the plasma polymeric films to BDD. The primary amino groups of the amine-modified Si/BDD surface were coupled with antraquinone derivatives as model electroactive compounds. Synthesized thin BDD-PPAAm films were investigated with X-ray photoelectron spectroscopy (XPS), laser induced fluorescence (LIF) and Fourier transform infrared spectroscopy (FT-IR). The FT-IR studies confirm that the molecular structure of the deposited layer reproduces the monomer structure with a partial transformation of amino groups into amide and nitrile. XPS results show that PPAAm film on an Si/BDD electrode is electrochemically stable within the range of polarization potentials between −1.1 and +1.1 V. The fluorescence properties of the PPAAm modified BDD surface makes its promising for application in sensors with optical readout. At the same time, the PPAAm film's durability investigated over a wide potential range makes it ideal for electrochemical sensors
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- Category:
- Articles
- Type:
- artykuł w czasopiśmie wyróżnionym w JCR
- Published in:
-
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
no. 211,
edition 10,
pages 2319 - 2327,
ISSN: 1862-6300 - Language:
- English
- Publication year:
- 2014
- Bibliographic description:
- Bogdanowicz R., Sawczak M., Niedziałkowski P., Zięba P., Finke B., Ryl J., Ossowski T.: Direct amination of boron-doped diamond by plasma polymerized allylamine film// PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. -Vol. 211, iss. 10 (2014), s.2319-2327
- DOI:
- Digital Object Identifier (open in new tab) 10.1002/pssa.201431242
- Verified by:
- Gdańsk University of Technology
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