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Electron attachment to hexafluoropropylene oxide (HFPO)

Abstract

We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attach- ment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.

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DOI:
Digital Object Identifier (open in new tab) 10.1063/1.5051724
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Copyright (2018 AIP Publishing)

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Category:
Articles
Type:
artykuł w czasopiśmie wyróżnionym w JCR
Published in:
JOURNAL OF CHEMICAL PHYSICS no. 149, edition 20, pages 1 - 7,
ISSN: 0021-9606
Language:
English
Publication year:
2018
Bibliographic description:
Zawadzki M., Chachereau A., Kočišek J., Franck C., Fedor J.: Electron attachment to hexafluoropropylene oxide (HFPO)// JOURNAL OF CHEMICAL PHYSICS. -Vol. 149, iss. 20 (2018), s.1-7
DOI:
Digital Object Identifier (open in new tab) 10.1063/1.5051724
Verified by:
Gdańsk University of Technology

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