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Abstract
We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attach- ment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.
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Authors (5)
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Alise Chachereau
-
Jaroslav Kočišek dr
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Christian Franck Prof.
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Juraj Fedor dr
Cite as
Full text
- Publication version
- Accepted or Published Version
- DOI:
- Digital Object Identifier (open in new tab) 10.1063/1.5051724
- License
- Copyright (2018 AIP Publishing)
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- Category:
- Articles
- Type:
- artykuł w czasopiśmie wyróżnionym w JCR
- Published in:
-
JOURNAL OF CHEMICAL PHYSICS
no. 149,
edition 20,
pages 1 - 7,
ISSN: 0021-9606 - Language:
- English
- Publication year:
- 2018
- Bibliographic description:
- Zawadzki M., Chachereau A., Kočišek J., Franck C., Fedor J.: Electron attachment to hexafluoropropylene oxide (HFPO)// JOURNAL OF CHEMICAL PHYSICS. -Vol. 149, iss. 20 (2018), s.1-7
- DOI:
- Digital Object Identifier (open in new tab) 10.1063/1.5051724
- Verified by:
- Gdańsk University of Technology
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