Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications

Anna Iwulska; Gerard Śliwiński

Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications

Abstract

In this work the preparation and structure properties of porous thin films of TiO2 were investigated. The films were produced by means of the pulsed laser deposition technique using laser pulses at 266nm (10Hz) and at fluencies of 1-3.5J/cm2. The process was performed in vacuum using O2 buffer gas and films were deposited on the SiO2 glass or Si substrate. X-ray diffraction (XRD) and Raman analysis of the structure and chemical composition of the obtained samples confirmed the presence of both anatase and rutile phase. For the O2 pressure applied above 10-2 hPa, the anatase bands were observed and below this value, rutile bands dominated in the Raman spectra in agreement with XRD data.

Authors (2)

Cite as

Full text

download paper

downloaded 4 times

Publication version: Accepted or Published Version
License: open in new tab

full content of the article see on external site open in new tab

Keywords

Details

Category:

Articles

Type:

artykuły w czasopismach recenzowanych i innych wydawnictwach ciągłych

Published in:

Photonics Letters of Poland no. 3, pages 98 - 100,
ISSN: 2080-2242

Language:

English

Publication year:

2011

Bibliographic description:

Iwulska A., Śliwiński G.: Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications// Photonics Letters of Poland. -Vol. 3., iss. 3 (2011), s.98-100

Sources of funding: