Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications - Publikacja - MOST Wiedzy

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Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications

Abstrakt

In this work the preparation and structure properties of porous thin films of TiO2 were investigated. The films were produced by means of the pulsed laser deposition technique using laser pulses at 266nm (10Hz) and at fluencies of 1-3.5J/cm2. The process was performed in vacuum using O2 buffer gas and films were deposited on the SiO2 glass or Si substrate. X-ray diffraction (XRD) and Raman analysis of the structure and chemical composition of the obtained samples confirmed the presence of both anatase and rutile phase. For the O2 pressure applied above 10-2 hPa, the anatase bands were observed and below this value, rutile bands dominated in the Raman spectra in agreement with XRD data.

Informacje szczegółowe

Kategoria:
Publikacja w czasopiśmie
Typ:
artykuły w czasopismach recenzowanych i innych wydawnictwach ciągłych
Opublikowano w:
Photonics Letters of Poland nr 3, strony 98 - 100,
ISSN: 2080-2242
Język:
angielski
Rok wydania:
2011
Opis bibliograficzny:
Iwulska A., Śliwiński G.: Preparation of porous TiO2 films by means of pulsed laser deposition for photocatalytic applications// Photonics Letters of Poland. -Vol. 3., nr. Vol. 3 (2011), s.98-100
Weryfikacja:
Politechnika Gdańska

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