Search results for: structurized surface

• XRD patterns of V2O5 thin films deposited on isotropic etching silicon substrates (111)

  Open Research Data

  open access

  • M. Prześniak-Welenc
  • B. Kościelska
  • J. Ryl

  - series: Vanadium oxides

  The DataSet contains the XRD patterns of  V2O5 thin films deposited on isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 30 to 90 seconds. The thin films were obtained by the sol-gel method. ...

• The AFM micrographs of isotropic etching silicon substrates (111)

  Open Research Data

  open access

  • M. Prześniak-Welenc
  • J. Karczewski
  • J. Ryl

  - series: Vanadium oxides

  The DataSet contains the atomic force microscope images of isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 20 to 90 seconds 

• SEM micrographs of V2O5 thin films deposited on isotropic etching silicon substrates (111)

  Open Research Data

  open access

  • M. Prześniak-Welenc
  • J. Karczewski
  • J. Ryl

  - series: Vanadium oxides

  The DataSet contains the scanning electron microscopy (SEM) micrographs of  V2O5 thin films deposited on isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 30 to 90 seconds. The thin films were...