Niniejsza praca dotyczy wytwarzania cienkich warstw dwutlenku tytanu metodą PLD. Za pomocą technik spektroskopowych zbadany został wpływ wartości ciśnienia gazu osłonowego na otrzymywane struktury krystaliczne w warstwach. Obserwowano także zależność uzyskanych faz krystalicznych od rodzaju odparowywanego materiału.

This study focuses on the development and optimization of MoO3 films on commercially available FTO substrates using the pulsed laser deposition (PLD) technique. By carefully selecting deposition conditions and implementing post-treatment procedures, precise control over crystallite orientation relative to the substrate is achieved. Deposition at 450 °C in O2 atmosphere results in random crystallite arrangement, while introducing...

The titanium dioxide target (99.7%) of 1 cm in dia was ablated in vacuum by laser pulses(6 ns) at 266 nm and at repetition rate of 10 Hz. During deposition the laser fluence between 1 and 3.5 J/cm2 and the O2 pressure from the range of 10-2 - 1 Pa were applied. The thin TiO2 films were deposited on glass substrate (1 × 1 cm2) heated up to 500 °C. The chemical composition of the film and samples produced by annealing were investigated...