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Description
This dataset contains SEM images of gold nanocubes (AuNC), which were deposited at the conductive Si wafer surface and dried. The deposition method, the solvent used and AuNC concentration have a significant influence on the homogeneous distribution and their agglomeration at the surface, further influencing the electrochemical characteristics of the electrodes operating with their use.
The surfactant used was CTAB. The images are characterized with surfactant concentration 1 mM CTAB. The amount of used AuNC was 10 uL. The volume of the solvent deposited at the surface was 5 mL. Label (A) means that sample was additionally washed with deionized water.
The topography analysis was investigated by scanning electron microscopy (FEI Quanta FEG 250) with an Everhart–Thornley secondary electron detector at an acceleration voltage of 20 kV.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
Restricted accessrestricted until published
- Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-08-06
- Dataset language:
- English
- Fields of science:
-
- chemical sciences (Natural sciences)
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/by3n-gw02 open in new tab
- Funding:
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- dataset Gold nanocubic structures agglomeration when put on conductive surfaces
- dataset Gold nanocubic structures agglomeration when put on conductive surfaces
- dataset Gold nanocubic structures functionalization with organic layers
- dataset Gold nanocubic structures agglomeration when put on conductive surfaces
- dataset Gold nanocubic structures agglomeration when put on conductive surfaces
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