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Description
The DataSet contains the XRD patterns and SEM micrographs of V2O5 nanorods on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C for 40 under a reducing atmosphere (94% Ar, 6% H2).
X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees. The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape.
The as-prepared thin film was annealed at 600C under oxidizing atmosphere for 10h, the information about thin film preparation is described in the Journal of Nanomaterials.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2015
- Verification date:
- 2021-05-25
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/5rrp-n844 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
- publication Struktury nanokrystaliczne w układzie V O: wytwarzanie i właściwości
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