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Laser reflectance interferometry system with a 405 nm laser diode for in-situ measurement of CVD diamond thickness
Abstract
In situ monitoring of the thickness of thin diamond films during technological processes is important because it allows better control of deposition time and deeper understanding of deposition kinetics. One of the widely used techniques is laser reflectance interferometry (LRI) which enables non-contact measurement during CVD deposition. The authors have built a novel LRI system with a 405 nm laser diode which achieves better resolution compared to the systems based on He-Ne lasers, as reported so far. The system was used for in situ monitoring of thin, microcrystalline diamond films deposited on silicon substrate in PA-CVD processes. The thickness of each film was measured by stylus profilometry and spectral reflectance analysis as a reference. The system setup and interferometric signal processing are also presented for evaluating the system parameters, i.e. measurement uncertainty, resolution and the range of measurable film thickness.
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- Category:
- Articles
- Type:
- artykuł w czasopiśmie wyróżnionym w JCR
- Published in:
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Metrology and Measurement Systems
no. XX,
pages 543 - 554,
ISSN: 0860-8229 - Language:
- English
- Publication year:
- 2013
- Bibliographic description:
- Kraszewski M., Bogdanowicz R.: Laser reflectance interferometry system with a 405 nm laser diode for in-situ measurement of CVD diamond thickness// Metrology and Measurement Systems. -Vol. XX, nr. 4 (2013), s.543-554
- Verified by:
- Gdańsk University of Technology
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