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• Chemical investigation of the Al2O3 ultra-thin films

  Dane Badawcze

  open access

  • M. Łapiński

  Ultra-thin layers of oluminum oxide (Al2O3) were deposited by ALD method.  Atomic layer deposition provides precise thickness control down to a single atomic layer. The precursors used were trimethylaluminum (Sigma-Aldrich) and purified water. The deposition of the atomic layer was carried out at 200 °C. Samples with a thickness of 2 and 8 nm of alumina...