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Description
The DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 thin films deposited on isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 30 to 90 seconds. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on the silicon substrate and vanadium thin films were obtained by annealing as-prepared films at 600°C under synthetic air.
The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape.
Dataset file
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-06-22
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/afje-2e07 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- dataset The AFM micrographs of isotropic etching silicon substrates (111)
- dataset XRD patterns of V2O5 thin films deposited on isotropic etching silicon substrates (111)
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
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