Structure evolution of V2O5 thin films deposited on silicon substrate - High-Temperature X-ray Diffraction

Description

The DataSet contains the XRD patterns of V2O5 thin films deposited on silicon substrates (111). The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on the silicon substrate. The structure was measured in-situ during heating between 50-800°C under synthetic air.

X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.

Dataset file

Silicon.zip

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Attribution
Raw data:: Data contained in dataset was not processed.

Details

Year of publication:

2021

Verification date:

2021-06-22

Dataset language:

English

Fields of science:

materials engineering (Engineering and Technology)

DOI:

10.34808/n7zk-px84

Series:

Vanadium oxides

Verified by:

Gdańsk University of Technology

Keywords

References

publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method

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