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Description
The DataSet contains the XRD patterns of V2O5 coatings on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C, 600C, and 700C for 10 under a reducing atmosphere (94% Ar, 6% H2).
The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape.
The as-prepared thin film was annealed at 300C under oxidizing atmosphere for 10h, the information about thin film preparation is described in the Journal of Nanomaterials.
Dataset file
XRD.zip
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File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2015
- Verification date:
- 2021-05-25
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/3g4r-cy55 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
- publication Struktury nanokrystaliczne w układzie V O: wytwarzanie i właściwości
- dataset SEM micrographs of the V2O5 coatings after thermal treatment under reducing atmosphere
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