Search
Description
The DataSet contains the XRD patterns of V2O5 coatings on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C, 600C, and 700C for 10 under a reducing atmosphere (94% Ar, 6% H2).
The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape.
The as-prepared thin film was annealed at 300C under oxidizing atmosphere for 10h, the information about thin film preparation is described in the Journal of Nanomaterials.
Dataset file
XRD.zip
22.8 kB,
S3 ETag
7f62a24aba30c3641d82b6b3dc894758-1,
downloads: 16
The file hash is calculated from the formula
Example script for calculation:
https://github.com/antespi/s3md5
hexmd5(md5(part1)+md5(part2)+...)-{parts_count} where a single part of the file is 512 MB in size.Example script for calculation:
https://github.com/antespi/s3md5
File details
- License:
-
open in new tab
CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2015
- Verification date:
- 2021-05-25
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/3g4r-cy55 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
- publication Struktury nanokrystaliczne w układzie V O: wytwarzanie i właściwości
- dataset SEM micrographs of the V2O5 coatings after thermal treatment under reducing atmosphere
Cite as
Authors
seen 51 times