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XRD patterns of vanadium oxide nanostructures on silicon substrate obtained by V2O5 recrystallization
Description
The DataSet contains the XRD patterns of vanadium oxide nanostructures on silicon substrates obtained by recrystallization of V2O5 thin films between 800-1200°C under synthetic air. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials.
X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.
Dataset file
silicon.zip
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File details
- License:
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CC BYAttribution - Raw data:
- Data contained in dataset was not processed.
Details
- Year of publication:
- 2021
- Verification date:
- 2021-06-22
- Dataset language:
- English
- Fields of science:
-
- materials engineering (Engineering and Technology)
- DOI:
- DOI ID 10.34808/keyh-g394 open in new tab
- Series:
- Verified by:
- Gdańsk University of Technology
Keywords
References
- dataset SEM micrographs of vanadium oxide nanostructures obtained by V2O5 recrystallization at 800°C
- dataset SEM micrographs of vanadium oxide nanostructures obtained by V2O5 recrystallization at 1000°C
- dataset SEM micrographs of vanadium oxide nanostructures obtained by V2O5 recrystallization at 1200°C
- publication The influence of thermal conditions on V2O5 nanostructures prepared by sol-gel method
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