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Abstract
Development of the optoelectronic system for non-invasive monitoring of diamond/DLC (Diamond-Like-Carbon) thin films growth during μPA ECR CVD (Microwave Plasma Assisted Electron Cyclotron Resonance Chemical Vapour Deposition) process is described. The system uses multi-point Optical Emission Spectroscopy (OES) and long-working-distance Raman spectroscopy. Dissociation of H2 molecules, excitation and ionization of hydrogen atoms as well as spatial distribution of the molecules are subjects of the OES investigation. The most significant parameters of the deposited film like molecular composition of the film can be investigated by means of Raman spectroscopy. Results of optoelectronic
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- DOI:
- Digital Object Identifier (open in new tab) 10.2478/v10077-009-0015-z
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- Category:
- Articles
- Type:
- artykuły w czasopismach recenzowanych i innych wydawnictwach ciągłych
- Published in:
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Advances in Materials Science
no. 9,
pages 47 - 53,
ISSN: 1730-2439 - Language:
- English
- Publication year:
- 2009
- Bibliographic description:
- Wroczyński P., Bogdanowicz R., Gnyba M.: Optoelectronic system for investigation of cvd diamond/DLC layers growth// Advances in Materials Science. -Vol. 9., nr. iss. 3=21 (2009), s.47-53
- DOI:
- Digital Object Identifier (open in new tab) 10.2478/v10077-009-0015-z
- Verified by:
- Gdańsk University of Technology
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