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Implementation of SiN thin film in fiber-optic sensor working in telecommunication range of wavelengths

Abstract

Mirrors are used in optical sensors and measurement setups. This creates a demand for mirrors made of new materials and having various properties tailored to specific applications. In this work, we propose silicon covered with a thin silicon nitride layer as a mirror for near-infrared measurements. SiN layer was deposited on a standard silicon wafer with a Low-Pressure Chemical Vapor Deposition furnace. Then, the created layer was investigated using ellipsometry and scanning electron microscope. Subsequently, the mirror was used as a reflecting surface in a Fabry–Perot fiber-optic interferometer. The mirror performance was investigated for wavelengths used in telecomunication (1310 nm and 1550 nm) and then compared with results obtained with the same measurement setup, with a silver mirror instead of silicon covered with SiN, as reference. Results showed that the proposed mirror can replace the silver one with satisfying results for investigated wavelengths.

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Accepted or Published Version
DOI:
Digital Object Identifier (open in new tab) 10.1038/s41598-021-00195-9
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Details

Category:
Articles
Type:
artykuły w czasopismach
Published in:
Scientific Reports no. 11,
ISSN: 2045-2322
Language:
English
Publication year:
2021
Bibliographic description:
Pawłowska S., Gierowski J., Stonio B., Juchniewicz M., Ficek M., Kruczkowski M., Szczerska M.: Implementation of SiN thin film in fiber-optic sensor working in telecommunication range of wavelengths// Scientific Reports -Vol. 11,iss. 1 (2021), s.22402-
DOI:
Digital Object Identifier (open in new tab) 10.1038/s41598-021-00195-9
Sources of funding:
Verified by:
Gdańsk University of Technology

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